Hologram Unit
HUL7001
Hologram Unit
For optical information processing
4.8鹵0.1
0.8脳5=4.0鹵0.2
Index mark for No.1
pin on reverse side
11.2鹵0.2
8.2鹵0.2
酶8.0
+0
鈥?.05
1
2
3
4
5
6
(0.2)
(0.5)
2.55鹵0.2
0.25 Lead frame
3.0鹵0.2
Unit : mm
Features
Smaller package size achieved through
micro-mirror integration
(4.8
脳
8.2
脳
4.3 mm)
Focus error signal detection : SSD method
Tracking error signal detection
: 3-beam method
Low-power semiconductor laser included
(0.3)
O
Y
Reference plane
Reference plane
Apparent emitting point
Apparent emitting point
Reference plane
Applications
CD
SEC. X-O-Y
(Note): 1.Standard corner R=0.20 max.
2.Thickness of plate:Ni 1碌m min.+Au 0.1碌m min.
3.Thickness of hologram=2.0mm, n=1.519
Absolute Maximum Ratings
(Ta = 25藲C)
Parameter
Laser beam output
Laser reverse voltage
Monitor PD reverse voltage
Signal processing PD reverse voltage
Operating ambient temperature
Storage temperature
Symbol
P
O
V
R(LD)
V
R(mon)
V
R
T
opr
T
stg
Ratings
0.3
2
12
12
鈥?10 to +60
鈥?40 to +85
Unit
mW
V
V
V
藲C
藲C
Unit Characteristic Specifications
(Tc = 25
鹵
3藲C)
Parameter
Threshold current
Operating current
Operating voltage
Laser beam output
Focus error signal amplitude
Tracking error signal amplitude
Focus error signal defocusing
Tracking error signal symmetry
Focus error signal pull-in range
*1
Measurements
Symbol
I
th*1
I
OP*1,2
V
OP*1,2
P
O*1,2
I
FE*1,3
I
TE*1,4
D
FO*1,5
B
TE*1,4
D
FE*1,3
CW
Conditions
CW I
RF
= 10碌A(chǔ), V
R
= 5V
CW I
RF
= 10碌A(chǔ), V
R
= 5V
I
RF
= 10碌A(chǔ), V
R
= 5V
I
RF
= 10碌A(chǔ), V
R
= 5V
I
RF
= 10碌A(chǔ), V
R
= 5V
I
RF
= 10碌A(chǔ), V
R
= 5V
I
RF
= 10碌A(chǔ), V
R
= 5V
I
RF
= 10碌A(chǔ), V
R
= 5V
,,,,
,
,, ,
,,,,
,,
8.1鹵0.2
min
20
25
0.50
0.78鹵0.2
1.33鹵0.2
typ
30
35
1.9
0.15
7
0.8
鈥?
鈥?30
10
1.3
12
are made using the reference optical system during measurement and the radiant power measurement system on
*2
It
the hologram unit shown in Fig. 2.
should be noted that the RF signal amplitude in these specifications is denoted by I
RF
, and represents the amplitude of the 11T
signal. As in the case described in
*1
, I
RF
is measured using the measurement system shown in Fig. 2.
*3
The
definition is illustrated in Fig. 3.
*4
The definition is illustrated in Fig. 4.
*5
The definition is illustrated in Fig. 5.
,,,,
,,,
SEC. X-O-Y
12
11
10 X
9
8
7
(0.35)
4.33鹵0.2
2.55鹵0.2
4.7鹵0.1
max
40
45
2.4
0.22
13
1.8
+8
+ 30
Unit
mA
mA
V
mW
碌A(chǔ)
碌A(chǔ)
%
%
碌m
1
1
2
3
4
5
