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Multiband Plasma-Process Monitor

Model C7460

The Multiband Plasma-Process Monitor

(MPM) is a system specifically designed for

monitoring the optical plasma emissions that

are created during the various manufacturing

processes of semiconductors including

etching, sputtering, cleaning, and CVD.

The MPM can handle multi-channel recording

in real-time.

q

Simultaneous measurement

from 200 to 950 nm

q

Easy measurement using

optical fiber input

q

High levels of accuracy and

reliability

q

Software for measurement,

analysis and factory integration

next

C7460相關型號PDF文件下載

• 型號
  版本
  描述
  廠商
  下載
• C7460
  英文版
  Multiband Plasma-Process Monitor
  HAMAMATSU
  C7460
• C7460
  英文版
  Multiband Plasma-Process Monitor
  HAMAMATSU ...
  C7460

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